The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2004
Filed:
Jun. 18, 2001
Daniel Zajfman, Rehovot, IL;
Oded Heber, Rehovot, IL;
Henrik B. Pedersen, Rehovot, IL;
Yinon Rudich, Rehovot, IL;
Irit Sagi, Rehovot, IL;
Michael Rappaport, Rehovot, IL;
Yeda Research and Development Co., Ltd., Rehovot, IL;
Abstract
A method for trapping of a plurality of charged particles in a charged particle trap. The trap includes first and second electrode mirrors having a common optical axis, the mirrors being arranged in alignment at two extremities thereof. The mirrors are capable, when voltage is applied thereto, of creating respective electric fields defined by key field parameters. The electric fields are configured to reflect charged particles causing their oscillation between the mirrors. The method includes introducing into the trap, along the optical axis, the plurality of charged particles as a beam having pre-determined key beam parameters. The method further includes choosing the key field parameters for at least one of the mirrors such as to induce bunching among charged particles in the beam.