The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2004
Filed:
Dec. 16, 2002
Toshitaka Hiro, Kanagawa, JP;
Kazuhiro Sakurai, Kanagawa, JP;
Showa Denko K.K., Tokyo, JP;
Abstract
Methods for continuously producing 2,3-dichloro-1-propanol (2,3-DCH) and epichlorohydrin in high yields and in a stabel manner for a long time are disclosed. In a method where allyl alcohol is chorinated in a hyrochloric acid solution and the reaction solution is introduced into a degassing tower to release hydrogen chloride and 2,3-DCH is obtained from the remaining solution, the concentraton of chlorine in the reaction mixture to be introduced into the degassing tower is maintaining to 0.015 g/ml or less and/or the partial pressure of chlorine gas in the reactor immediately before the degassing tower to 0.08 MPa or less, by monitoring and/or the partial pressure of chlorine gas in the reactor immediately before the degassing tower to 0.08 MPa or less, by monitoring and/or controlling the chlorine concentration of a solution at the outlet of the reactor immediately before the degassing tower and/or the partial pressure of chlorine gas present in the gas phase section of the reactor and the flow rate of chlorine gas immediately before the degassing tower.