The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 25, 2004

Filed:

Jun. 20, 2001
Applicant:
Inventors:

Robert Jacob von Gutfeld, New York, NY (US);

James H. Glownia, Somers, NY (US);

Fuad Elias Doany, Katonah, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/1335 ; B32B 3/128 ;
U.S. Cl.
CPC ...
G02F 1/1335 ; B32B 3/128 ;
Abstract

A system (and method) includes a first substrate having both a transparent region and alternating opaque and transparent regions with respect to incident electromagnetic radiation, a radiation diffuser at least partially transparent to the incident electromagnetic radiation, a coupler for attaching the radiation diffuser to the first substrate to form a diffuser-substrate interface, a polymer used for affixing the first substrate to a second substrate, the polymer positioned between the first substrate and the second substrate along at least a peripheral region common to both the first and the second substrates, and a source of electromagnetic radiation incident onto the diffuser attached to the substrate for polymerizing the polymer.


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