The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 25, 2004

Filed:

Dec. 07, 2001
Applicant:
Inventors:

Walter H. Ohrbom, Hartland Township, MI (US);

Robert D. Weise, Harper Woods, MI (US);

James A. Laugal, White Lake, MI (US);

Assignee:

BASF Corporation, Southfield, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 3/304 ; C08L 6/700 ; C08L 7/504 ;
U.S. Cl.
CPC ...
C08L 3/304 ; C08L 6/700 ; C08L 7/504 ;
Abstract

The invention relates to an economical method of making a polymer having reduced VOCs and coating compositions containing such polymers. In one embodiment, the method of invention requires providing a reactant mixture (a), providing a solvent mixture (b) comprising a reactive component (c) which is substantially free of any heteroatoms and is not a crystalline solid at room temperature and comprises (i) from 12 to 72 carbon atoms, and (ii) at least two functional groups, and subjecting the reactant mixture (a) in the solvent mixture (b) to polymerization conditions sufficient to polymerize reactant mixture (a) to provide a mixture (d) of a polymer (a′) in solvent mixture (b), wherein reactive component (c) under the polymerization conditions is substantially nonreactive: (1) with the components of reactive mixture (a), (2) in the polymerization of reactant mixture (a) and (3) with the polymer (a′). Coating compositions of the invention comprising polymers made by the disclosed method provide low VOCs without any reduction in application or performance properties.


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