The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2004
Filed:
Nov. 06, 2001
Applicant:
Inventors:
John Border, S. Wales, NY (US);
Paul O. Mclaughlin, Rochester, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 ; B29D 1/100 ;
U.S. Cl.
CPC ...
G03F 7/00 ; B29D 1/100 ;
Abstract
A method is disclosed for making deep microstructures in photoresist. The method utilizes a pool of photoresist on top of a transparent substrate and the laser is located below the substrate. Structures are created in the photoresist by transmitting the laser light through the substrate up into the photoresist. Since the photoresist does not have to be spin coated onto the substrate, very thick layers of photoresist can be used while the thickness uniformity is determined by the substrate surface. Alternately, a contoured substrate can be used while producing uniform structures.