The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2004
Filed:
Mar. 20, 2002
Applicant:
Inventor:
Masaki Yoshizawa, Kanagawa, JP;
Assignee:
Sony Corporation, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 5/00 ;
U.S. Cl.
CPC ...
G03C 5/00 ;
Abstract
A method of designing a chemical amplification type photosensitive composition containing an acid generating agent, wherein the average distance between exposure particles in an exposure area of the photosensitive composition upon pattern exposure of the photosensitive composition or the average distance between the acids generated by the pattern exposure is calculated based on the sensitivity required of the photosensitive composition, and the composition of the photosensitive composition is set so that the diffusion length of the acid generated from the acid generating agent by the pattern exposure is greater than the calculated average distance.