Apparatus and method for cleaning peripheral part of substrate

Abstract

A cleaning apparatus ( ) for cleaning a peripheral part of a substrate holds a peripheral part of a substrate ( ) between the elastic porous member ( ) of an upper cleaning roller ( ) and an elastic porous member ( ) of a lower cleaning roller ( ). The power of a drive motor ( ) is transmitted through a drive pulley ( ), a belt ( ) and a driven pulley ( ) to a rotating shaft ( ) to rotate the lower cleaning roller ( ), and is transmitted through a drive pulley ( ), a belt ( ) and a driven pulley ( ) to a rotating shaft ( ) to rotate the upper cleaning roller ( ) in a direction opposite the direction in which the lower cleaning roller ( ) is rotated. A cleaning liquid is supplied through cleaning liquid supply nozzles ( ) and cleaning liquid supply pipes ( ) into core members ( ). Then the cleaning liquid flows through connecting holes ( ) formed in the circumferential walls of the core members ( ) and permeates the elastic porous members ( ). In this state, the upper cleaning roller ( ) and the lower cleaning roller ( ) are rotated, and the upper cleaning roller ( ) and the lower cleaning roller ( ) are moved relative to the substrate ( ) by a base ( ) along the peripheral part of the substrate ( ) held between the elastic porous members ( ) of the upper and the lower cleaning rollers ( ). Splashing of the cleaning liquid can be effectively prevented and the quality of a high-definition pattern formed on the substrate ( ) can be preserved.