The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2004
Filed:
May. 20, 2002
Applicant:
Inventors:
James H. Underwood, Martinez, CA (US);
Rupert C. C. Perera, Martinez, CA (US);
Patrick Naulleau, Martinez, CA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 2/188 ;
U.S. Cl.
CPC ...
G01N 2/188 ;
Abstract
A system for inspecting lithography masks utilizing a laser source to produce a coherent electromagnetic radiation pulse. The pulse is passed to a target which creates a plasma resulting in an extreme ultraviolet (EUV) beam. The beam is condensed and passed through an aperture to define a cross-sectional area of the condensed EUV beam on a lithography mask. A transmission zone plate resolves the image reflected from the lithography mask and passes the image to a detector for analysis.