The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2004
Filed:
Jun. 13, 2002
Applicant:
Inventors:
Assignee:
Sony Corporation, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 1/749 ;
U.S. Cl.
CPC ...
H01J 1/749 ;
Abstract
A plasma display device comprises a first panel provided with discharge sustaining electrodes and a dielectric layer on the inside thereof, and a second panel laminated on the first panel so as to form discharge spaces on the inside, wherein the dielectric layer comprises a silicon oxide layer having a density of not less than 6.1×10 atoms/cm . Preferably, the density of the silicon oxide layer is not less than 6.4×10 atoms/cm . Where a sputtering method is used as a method of forming the silicon oxide layer, the concentration of oxygen gas in an atmosphere gas introduced into the sputtering apparatus is controlled to be 5 to 30 vol % during film formation.