The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 18, 2004

Filed:

Dec. 03, 2001
Applicant:
Inventor:

Jin Udagawa, Ageo, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/7304 ;
U.S. Cl.
CPC ...
H01J 3/7304 ;
Abstract

Devices and methods are disclosed for monitoring temperature of certain components (e.g., lenses, deflectors, and stages) in real time during operation of a microlithography apparatus, especially a charged-particle-beam microlithography apparatus. The components have associated therewith respective temperature sensors that provide temperature data to a temperature-monitoring device. The temperature-monitoring device interprets the data and routes corresponding signals to a controller that commands certain responsive action by any of various components of the apparatus serving to control the temperatures within respective specified tolerances. If a sudden temperature change occurs in a monitored component of the apparatus, then a warning device activates an alarm, and the controller commands corrective actions to return the culprit temperature to within the specified gradient. Depending upon the magnitude of the detected temperature deviation, the controller can initiate a calibration routine of the microlithography apparatus.


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