The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2004
Filed:
Nov. 29, 2002
David R. Douglas, Yorktown, VA (US);
Byung C. Yunn, Yorktown, VA (US);
Southeastern Univ. Research Assn., Inc., Newport News, VA (US);
Abstract
A particle beam bending system having a geometry that applies active bending only beyond the chord of the orbit for any momentum component. Using this bending configuration, all momentum components emerge dispersed in position only; all trajectories are parallel by construction. Combining a pair of such bends with reflective symmetry produces a bend cell that is, by construction, achromatic to all orders. By the particular choice of 45° individual bends, a pair of such achromats can be used as the basis of a 180° recirculation arc. Other rational fractions of a full 180° bend serve equally well (e.g., 2 bends/cell×90°/bend×1 cell /arc; 2 bends/cell×30°/bend×3 cells/arc, etc), as do combinations of multiple bending numerologies (e.g., 2 bends/cell×22.5°/bend×2 cells+2 bends/cell×45°/bend×1 cell). By the choice of entry pole face rotation of the first magnet and exit pole face rotation of the second magnet (with a value to be determined from the particular beam stability requirements imposed by the choice of bending angle and beam properties to be used in any particular application), desirable focusing properties can be introduced and beam stability can be insured.