The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2004
Filed:
May. 10, 2001
Applicant:
Inventors:
Philipp Steinmann, Munich, DE;
Stuart M. Jacobsen, Frisco, TX (US);
Louis N. Hutter, Plano, TX (US);
Fred D. Bailey, Irving, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/120 ;
U.S. Cl.
CPC ...
H01L 2/120 ;
Abstract
A method for integrating a thin film resistor into an interconnect process flow where one of the metal layers is used as a hardmask. After a via ( ) etch and fill, the thin film resistor material ( ) is deposited. The metal interconnect layer ( ) is then deposited, including any barrier layers desired. The metal leads ( ) are then etched together with the shape of the thin film resistor ( ). The metal ( ) over the thin film resistor ( ) is then removed.