The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6737205 B1

PDF
Full Text
Expired
Date of Patent:
May. 18, 2004

Filed:

Apr. 30, 2002
Applicant:
Inventors:

John George Maltabes, Austin, TX (US);

Alain Bernard Charles, Singapore, SG;

Karl E. Mautz, Round Rock, TX (US);

Assignee:

Motorola, Inc., Schaumburg, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract

An arrangement for transferring a pattern from a mask ( ) onto a wafer is provided. A product area ( ) of the mask ( ) is at least partly surrounded by a frame ( ) having an alignment mark area ( ). In order to avoid the need to produce a specific mask set for different alignment styles, the mask ( ) and the frame ( ) are designed as being separate units. Further, methods for transferring a pattern from a mask to a wafer are provided that employ a frame separated from a product area.


Find Patent Forward Citations

Maltabes, John. (2004). Arrangement and method for transferring a pattern from a mask to a wafer (U.S. Patent No. 6737205). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6737205

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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