The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2004
Filed:
Jul. 12, 2000
Dong-Il Cho, Seoul, KR;
Techbank Corporation, Seoul, KR;
Abstract
The silicon etching apparatus using XeF includes: a basic structure composed of a loading chamber tot loading XeF , an expansion chamber for collecting sublimated XeF gas, and an etching chamber for performing an etching process; and a means for injecting nitrogen prior to the etching process to eliminate air moisture in the apparatus and thus preventing the formation of HF. The silicon etching apparatus using XeF further includes: an injector having a predefined shape provided in the etching chamber for uniformly injecting the XeF gas downward on to surface of a wafer; a feedback controller for feedback controlling the internal pressure of the loading chamber in order to prevent sublimation of the residual XeF in the loading chamber; and a weight scale for measuring the weight of XeF in the loading chamber.