The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2004
Filed:
Sep. 24, 2001
Kenichi Kotoku, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus for sequentially performing exposure of device patterns provided in a pattern effective area of a photo-mask ( ) on to shot areas of a wafer ( ), to provide excellent throughput performance, includes an illumination unit ( ) for collectively illuminating the entire pattern effective area of the photo-mask contained within the illumination range with exposure light, a mask stage ( ) that moves the photo-mask for the illumination range in the mask scanning direction, and a wafer stage ( ) that moves the wafer for the projection range in which the pattern effective area of the photo-mask is projected in the wafer scanning direction. A control unit ( ), after containing at least one shot area of the wafer within the projection range to perform exposure of device patterns provided in the pattern effective area of the photo-mask onto the one shot area of the wafer, synchronizes and controls the movements of the mask stage and the wafer stage while keeping the entire pattern effective area of the photo-mask contained within the illumination range.