The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2004
Filed:
Apr. 16, 2002
Katsuaki Yanagiuchi, Tokyo, JP;
Wakako Shiramura, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
An electron device includes a first layer formed of a metal or metal alloy and a second layer adjoining the first layer and formed of a metal or metal alloy different from that of the first layer. In the region adjacent the first layer and the second layer, there is provided a concentration gradient layer formed of a mixture containing a metal or metal alloy contained in the first layer and a metal or metal alloy contained in the second layer. A covering film covers end faces of the first and second layers. With this arrangement, when a cleaning as by etching is carried out on the end faces of the multilayered film structure of the electron device, the end faces are etched in relatively smoothly connected surfaces because of the etched end face of the concentration gradient layer in a gentle slope, so that coverage of the covering film on the end faces of the multilayered film structure can be improved to increase the adherence strength of the covering film.