The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2004
Filed:
Dec. 27, 2001
Toyohito Asanuma, Yokohama, JP;
Kenichi Shimomai, Mito, JP;
Victor Company of Japan, Yokohama, JP;
Abstract
A method for manufacturing a disk substrate for mass production of a phase change optical disk, wherein an original disk substrate is having a resist layer ( ) applied on a glass substrate ( ), composed of the steps of forming a depression (pit “p ” and groove “g ”) having a first and a second depth by cutting laser to be exposed on the surface of the resist layer ( ), etching the depression having the first depth and the second depth from the surface of the resist layer ( ) of the disk substrate in atmosphere mixed with Argon and Oxygen in ratio of 10 to 90% under gas pressure of 0.1 to 1.5 Pa, wherein the first and the second depth of the depression (pit “p ” and groove “g ”) become predetermined value respectively, and ashing the resist layer ( ) from the glass substrate ( ).