The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2004
Filed:
Jan. 29, 2002
Kuei-Jung Chao, Hsinchu, TW;
Chia-Min Yang, Kaohsiung, TW;
Other;
Abstract
A method of confined synthesis of nanostructured material inside a mesoporous material. The method includes the step of providing mesoporous material having uniform and ordered mesopores. Next, a monolayer of charged functional group is attached on the pore surface of mesoporous host material by reacting with functional molecule. A oppositely-charged molecule is incorporated into the confined space of mesoporous material by either ion exchange or incipient wetness impregnation. Finally, the incorporated molecule is reduced or oxidized or further reacted with secondarily-incorporated molecule to form nanostructured material in mesoporous material.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile