The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2004
Filed:
Feb. 28, 2002
Applicant:
Inventor:
Tihiro Ohkawa, La Jolla, CA (US);
Assignee:
Archimedes Technology Group, Inc., San Diego, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/6513 ;
U.S. Cl.
CPC ...
C23C 1/6513 ;
Abstract
An apparatus for removing selected metal ions from a plasma includes a plasma chamber and at least one silica substrate mounted inside the chamber. More specifically, the substrate is exposed in the chamber so that when metal ions from the plasma contact the substrate they diffuse into the substrate to create a liquified layer. A receptacle is also provided to receive the liquid from the layer as it flows from the substrate.