The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2004
Filed:
Apr. 05, 2001
Applicant:
Inventor:
Sudarsan Srinivasan, Fremont, CA (US);
Assignee:
Aradigm Corporation, Hayward, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B 1/700 ; B65D 1/32 ;
U.S. Cl.
CPC ...
B05B 1/700 ; B65D 1/32 ;
Abstract
Methods of generating pores in thin sheets of material, typically thin polymer films, are provided. The methods allow for generation of pores which uniformly penetrate the material. The method comprises laminating a thick film onto a thin film, then directing a laser source onto the thin film so as to form pores through the thin film. The increased stiffness conferred by the thick film reduces wrinkle formation in the thin film, resulting in uniform thickness of the thin film and consequent uniformity of pore depth. The invention further provides aerosolization containers and devices comprising membranes formed according to the invention.