The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2004
Filed:
Mar. 22, 2002
Jane K. Gates, Minnetonka, MN (US);
Jeffery K. Berkowitz, Carver, MN (US);
Lance E. Stover, Eden Prairie, MN (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
A method for producing magnetoresistive heads includes the steps of placing a substrate having a plurality of transducers in an environment including a focused ion beam. The focused ion beam is directed onto the first MR element. A property level, generally the resistance associated with the MR stripe, of the first MR element is monitored until the resistance reaches a desired level. The focused ion beam is redirected onto a second area of the substrate which includes the second MR element. The electrical resistance of the second MR element is monitored as the focused ion beam acts on the second MR element until the resistance of the MR element reaches a desired level. Using this process, the resistivity of individual MR elements within the substrate can be tightly controlled.