The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 2004

Filed:

Aug. 23, 2001
Applicant:
Inventors:

William K. Warburton, Menlo Park, CA (US);

John Wahl, Fremont, CA (US);

Michael Momayezi, Fremont, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/900 ;
U.S. Cl.
CPC ...
G06F 1/900 ;
Abstract

A method and counter for reducing the background counting rate in gas-filled alpha particle counters wherein the counter is constructed in such a manner as to exaggerate the differences in the features in preamplifier pulses generated by collecting the charges in ionization tracks produced by alpha particles emanating from different regions within the counter and then using pulse feature analysis to recognize these differences and so discriminate between different regions of emanation. Thus alpha particles emitted from the sample can then be counted while those emitted from the counter components can be rejected, resulting in very low background counting rates even from large samples. In one embodiment, a multi-wire ionization chamber, different electric fields are created in different regions of the counter and the resultant difference in electron velocities during charge collection allow alpha particles from the sample and counter backwall to be distinguished. In a second embodiment, a parallel-plate ionization chamber, the counter dimensions are adjusted so that charge collection times are much longer for ionization tracks caused by sample source alpha particles than for those caused by anode source alpha particles. In both embodiments a guard electrode can be placed about the anode's perimeter and secondary pulse feature analysis performed on signal pulses output from a preamplifier attached to this guard electrode to further identify and reject alpha particles emanating from the counter's sidewalls in order to further lower the counter's background.


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