The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 2004

Filed:

May. 17, 2002
Applicant:
Inventor:

Dean Liu, West Hills, CA (US);

Assignee:

Aetas Technology Inc., Irvine, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03G 1/508 ;
U.S. Cl.
CPC ...
G03G 1/508 ;
Abstract

The present invention is directed to a shutter system for electrophotographic machines that effectively reduces the impact of ambient light on the photoreceptor, or image-bearing member. The shutter system of the present invention utilizes a shutter member that substantially covers the cartridge chamber when in a closed position. Preferably, the shutter member is disposed at the opening of the cartridge chamber. The shutter member is held in place by one or more support brackets and is biased to the closed position by one or more springs.


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