The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2004
Filed:
Nov. 21, 2000
Applicant:
Inventors:
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 2/980 ;
U.S. Cl.
CPC ...
H01J 2/980 ;
Abstract
A shadow mask for use in a cathode ray tube comprises a mask body having a mask effective section where a number of electron beam passage apertures are formed and a skirt portion provided at a peripheral edge of the mask effective section, and a mask frame arranged to be layered outside the skirt portion. The mask frame and the skirt portion are resistance-welded to each other at a plurality of portions. At each welding portion, a plurality of concave and/or convex portions each having a smaller area than an area of a contact surface of an electrode for resistance-welding are formed at an inner surface portion of the skirt portion which the electrode contacts.