The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6730975 B1

PDF
Full Text
Expired
Date of Patent:
May. 04, 2004

Filed:

Jul. 30, 2002
Applicant:
Inventors:

Byung-Jun Park, Kyunggi-do, KR;

Kyu-Hyun Lee, Kyunggi-do, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 3/1119 ;
U.S. Cl.
CPC ...
H01L 3/1119 ;
Abstract

A DRAM device in which a portion of bit lines has enlarged width portions at a portion of a peripheral/core area to be connected with upper layered circuit wiring through metal contacts, includes spacers formed of a layer of material having an etch selectivity with respect to a bit line interlayer insulating layer deposited after said bit lines are formed, and disposed on sides of an upper surface of each said enlarged width portion to protect sides of said enlarged width portions; an interlayer insulating layer and at least a portion of an etch stop layer disposed between said bit lines and transistors of a substrate; and metal contact pads formed along with bit line contact plugs to pass through said interlayer insulating layer and said etch stop layer.


Find Patent Forward Citations

Park, Byung-Jun. (2004). Dram device (U.S. Patent No. 6730975). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6730975

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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