The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2004
Filed:
Sep. 10, 2002
Applicant:
Inventors:
Hsi-Hsiang Lin, Hsinchu, TW;
Chien-Yang Chen, Hsinchu Hsien, TW;
Assignee:
Industrial Technology Research Institute, Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/708 ;
U.S. Cl.
CPC ...
H01J 3/708 ;
Abstract
An electron anti-reflection arrangement includes a substrate, an electron resistant layer formed on a top side of the substrate, and an electron anti-reflective layer provided in between the substrate and the electron resistant layer for enabling an electron beam to pass to the inside of the substrate in an incident direction and minimizing the amount of electrons of the electron beam that return to the electron resistant layer after reflection by the substrate.