The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2004
Filed:
Jul. 15, 2002
Michitsugu Arima, Kamiina-gun, JP;
Olympus Corporation, Tokyo, JP;
Abstract
The present invention provides a method of manufacturing a three-dimensional structure having portions different in thickness, the method comprising forming a laminated structure, which comprises at least two layers to be processed and at least one inner mask interposed between the layers, the layers and the inner mask being joined together, such that the laminated structure has top and bottom major surfaces, forming an outer mask on at least one of the major surfaces of the laminated structure, selectively etching the layers from one of the major surfaces of the laminated structure through the outer mask to expose the inner mask and then through the inner mask, so that the portions different in thickness are formed by one etching process.