The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2004
Filed:
May. 24, 2000
Richard L. Sutherland, Dayton, OH (US);
John Sappington, West Alexandria, OH (US);
Donna M. Brandelik, New Carlisle, OH (US);
Stephen A. Siwecki, Dayton, OH (US);
Christina K. Shepherd, Dayton, OH (US);
Robert T. Pogue, Springboro, OH (US);
Science Applications International Corporation, San Diego, CA (US);
Abstract
The present invention offers increased efficiency and quality in the duplication of a master hologram utilizing an improved method of contact printing. This improved method of contact printing employs a polymer-dispersed liquid crystal (PDLC) recording medium as the duplication blank and/or the master hologram material. The optical qualities of the PDLC material described herein provide an improved method of duplication using single beam contact printing regardless of the material comprising the master hologram. Thus, master holograms originally recorded using highly complex optical geometries (e.g., computer generated holograms) are capable of duplication without the need for multiple beam power/intensity balancing and long recording times. The improved hologram contact printing method described herein works with virtually any type of master hologram, including both reflection and transmission holograms.