The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2004
Filed:
Mar. 14, 2002
Applicant:
Inventors:
Jian-Ping Wang, Singapore, SG;
Jianzhong Shi, Singapore, SG;
Assignee:
Data Storage Institute, Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/434 ; C23C 1/600 ; B05C 1/111 ;
U.S. Cl.
CPC ...
C23C 1/434 ; C23C 1/600 ; B05C 1/111 ;
Abstract
An oblique sputtering deposition apparatus is provided for preparing a thin film. A collimator having angled passages for filtering out particles from stray directions is placed between the substrate and the incident particle flux. The angle of the passages can be adjusted from about 0 to about 90° with respect to the substrate normal according to requirements. The oblique incidence of particle flux brings forms a column structure which is also angled.