The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2004
Filed:
Jul. 31, 2001
J. Ross Talley, Nampa, ID (US);
Wyland L. Atkins, Kuna, ID (US);
SCP Global Technologies, Inc., Boise, ID (US);
Abstract
A method for exposing an object to fluid using principles of the present invention includes the steps of introducing the object into a coanda flow forming passage and directing a coanda jet onto a coanda profile that surrounds the object to cause amplified flow to surround the object and move axially through the passage. An apparatus for exposing an object to fluid utilizing principles of the present invention includes a chamber having an enclosed coanda profile and a fluid inlet such as a coanda slot fluidly coupled to the passage. The passage is proportioned to receive an object to be treated. In one embodiment of the method and apparatus, fluid apertures for focusing an additional fluid onto the object may be positioned within the chamber, and a fluid may be directed from the apertures onto the object to clean the object before the object is dried using the amplified flow through the chamber.