The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2004
Filed:
Aug. 01, 2002
Joseph E. Stagnitto, Rochester, NY (US);
Thomas W. Palone, Rochester, NY (US);
Camiel J. Raes, Phelps, NY (US);
James A. White, Conesus, NY (US);
Joseph Yokajty, Webster, NY (US);
Gopalan Rajeswaran, Fairport, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method for making a shadow mask array is taught. Producing a plurality of shadow mask sections; inspecting the plurality of shadow mask sections to determine which shadow mask sections are acceptable as meeting predetermined criteria; positioning a predetermined number of the acceptable mask sections into predetermined locations relative to one another to form a mask section array thereby distributing any error in individual mask sections across the mask section array; and attaching the individual mask sections of the mask section array to a support structure. The support structure allows for expansion and/or contraction of the individual mask sections of the mask section array while maintaining relative positioning of the individual shadow mask section in the shadow mask array. The support structure further allows for compliance of the shadow mask array in a direction normal to the plane of the shadow mask array thereby allowing for a substantially planar interface between the shadow mask array and a substrate to be coated.