The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 27, 2004

Filed:

Apr. 05, 2002
Applicant:
Inventors:

Joshua M. Cobb, Victor, NY (US);

Jeffery R. Hawver, Rochester, NY (US);

Andrea S. Rivers, Bloomfield, NY (US);

Roger A. Morton, Penfield, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/732 ; G03B 3/514 ; B41J 2/435 ;
U.S. Cl.
CPC ...
G03B 2/732 ; G03B 3/514 ; B41J 2/435 ;
Abstract

A method of sensing the pitch or relative location of a lenticular lens on a sheet of transparent lenticular material of the type having a repeating pattern of cylindrical lenses on one side and a flat opposite side, comprising the steps of: forming a beam of light; focusing the beam of light into a spot smaller than the pitch of the cylindrical lenses onto the lenticular material; moving the lenticular material relative to the beam in a direction perpendicular to the axes of the cylindrical lenses to modulate the angle of reflection or refraction of the beam of light; and sensing the position of the modulated beam of light to determine the pitch or relative location of lenticular material to the focused spot.


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