The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2004
Filed:
Apr. 10, 2001
Applicant:
Inventors:
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ; H01L 2/100 ;
U.S. Cl.
CPC ...
H01L 2/1302 ; H01L 2/100 ;
Abstract
For providing a cleaning technique capable of removing metal contamination at a low temperature and in a short period of time, an aqueous solution containing 0.1 to 15% by weight of hydrochloric acid, 0.01 to 0.3% by weight of hydrofluoric acid and 0.1 to 15% by weight of hydrogen peroxide is used as a cleaning solution for cleaning a semiconductor substrate after forming a gate electrode of a polymetal structure on the semiconductor substrate.
Quick Actions:
Takeshima, Yutaka. (2004). Fabrication method for semiconductor device (U.S. Patent No. 6727187). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6727187
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile