The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2004
Filed:
Oct. 31, 2002
Jun Hashimoto, Miyagi, JP;
Oki Electric Industry Co., Ltd., Tokyo, JP;
Abstract
A manufacturing method for a semiconductor storage device with a floating gate includes a first step for depositing a first thermally-oxidized film ( ) on a poly-silicon film ( ) that has been etched to a desired depth so as to have a tapered etched end by using a silicon nitride film ( ) having an opening as a mask, a step for depositing a first NSG film side wall spacer ( ) that covers the tapered portion on an opening side wall of the silicon nitride film ( ) and adding heat treatment thereto, a step for forming a second NSG film side wall spacer ( ) on the inner side of the first NSG film side wall spacer , a step for forming a poly-silicon plug ( ), then depositing a second thermally-oxidized film ( ) on the poly-silicon plug ( ), a step for removing the silicon nitride film ( ), then etching the poly-silicon film ( ), and a step for removing the first NSG film side wall spacer ( ).
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile