The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2004
Filed:
Jul. 12, 2001
Emmanuel Kwaku Foli Ankutse, Round Rock, TX (US);
Russell Clinton Brown, Austin, TX (US);
Konstantinos Kyriakopoulos, Austin, TX (US);
Yurong Shi, Austin, TX (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
The statistical process control (SPC) subsystem is the heart of the data collection and process control system for semiconductor manufacturing in the various embodiments as disclosed herein. SPC is responsible for performing calculations to generate statistics on collected measurement data, applying rules to the statistics, and executing error actions when those rules are violated. SPC subsystem plays a role in corrective actions as well by lifting restrictions previously imposed on tools or lots as a result of rule violations. In an embodiment, SPC is supported through underlying transaction and performance monitoring system components. In an embodiment, SPC procedure is a statistical engine that performs what the process control strategy (PCS) describes, hence there is at least one SPC procedure for each PCS. Components in SPC send data to the chart client subsystem as embodied herein, which allows visualization of statistics generated by SPC procedure in graphical chart form via a web browser. SPC communicates with MES via an interface.