The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2004
Filed:
Aug. 16, 2000
Sung Dae Kim, Daejeon, KR;
Sang Hu Park, Kyungki-Do, KR;
LG Electronics Inc., Seoul, KR;
Abstract
The present invention relates to a shadow mask comprising an effective surface including electron beam passage holes all over, an ineffective surface having a certain width surrounding the circumference of the effective surface, a skirt portion curved formed on the circumference of the ineffective surface, and concave-compressed beads formed on the ineffective surface along the skirt portion in order to improve the stiffness of the effective surface. The present invention can prevent distortions of a screen by forming the beads on the ineffective surface which is capable of improving stiffness of the shadow mask by increasing a lot value of the section modulus performing a function resisting the relative vibration occurred between the effective surface and skirt portion.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile