The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 20, 2004

Filed:

Apr. 15, 2003
Applicant:
Inventors:

Girsh Blumberg, New Providence, NJ (US);

Peter B. Littlewood, Cambridge, GB;

Assignee:

Lucent Technologies Inc., Murray Hill, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/976 ;
U.S. Cl.
CPC ...
H01L 2/976 ;
Abstract

A field-effect transistor (FET) includes a source electrode, a drain electrode, a gate electrode, a gate dielectric, and a semiconductor layer that functions as an active channel of the transistor. The active channel is configured to carry a current between the source and drain electrodes and has a conductivity responsive to voltages applied the gate electrode. The gate dielectric is located between the gate electrode and the semiconductor layer and includes a quasi-1D charge or spin density wave material.


Find Patent Forward Citations

Blumberg, Girsh. (2004). Field-effect transistors with high-sensitivity gates (U.S. Patent No. 6724056). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6724056

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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