The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 20, 2004

Filed:

Feb. 12, 2001
Applicant:
Inventors:

Shahriar Naghshineh, Allentown, PA (US);

Jeff Barnes, Bath, PA (US);

Ewa B. Oldak, Bethlehem, PA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 1/62 ; C11D 3/30 ; C11D 3/43 ;
U.S. Cl.
CPC ...
C11D 1/62 ; C11D 3/30 ; C11D 3/43 ;
Abstract

A cleaning solution for cleaning microelectronic substrates, particularly for post-CMP or via formation cleaning. The cleaning solution comprises a quaternary ammonium hydroxide, an organic amine, a corrosion inhibitor, optionally an organic acid, and water. A preferred cleaning solution comprises tetramethylammonium hydroxide, monoethylanolamine, gallic acid ascorbic acid, and water with the alkalinity of the cleaning solution greater than 0.073 milliequivalents base per gram of solution.


Find Patent Forward Citations

Naghshineh, Shahriar. (2004). Post chemical-mechanical planarization (cmp) cleaning composition (U.S. Patent No. 6723691). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6723691

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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