The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2004
Filed:
Apr. 08, 2002
Ishikawajima-Harima Heavy Industries Co., Ltd., Tokyo, JP;
Abstract
A method for fabricating a CMC (Ceramic Matrix Composite) article, comprising: performing a CVI (Chemical Vapor Infiltration) treatment for forming a SiC matrix layer on the surface of a woven fabric; performing a machining process, after the CVI treatment, for machining the woven fabric; and performing a PIP (Polymer Impregnation and Pyrolysis) treatment, after the machining process, for impregnating an organic silicon polymer as a base material into voids in the matrix layer and pyrolyzing the organic silicon polymer. By this method, the throughput of CMC articles can be preferably increased. The throughput may be further increased by performing a slurry impregnation treatment before or after the PIP treatment, in which slurried SiC is impregnated into the voids in the matrix layer.