The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2004
Filed:
Aug. 16, 2002
Tihiro Ohkawa, La Jolla, CA (US);
Archimedes Technology Group, Inc., San Diego, CA (US);
Abstract
A high throughput plasma mass filter includes a substantially cylindrical shaped plasma chamber with structures for generating a magnetic field (B) that is crossed with an electric field (E) in the chamber (E×B). An injector introduces into the chamber a multi-species plasma having ions of different mass to charge ratios. To obtain high throughput (&Ggr;), the initial density of this multi-species plasma is considerably greater than a collisional density wherein there is a probability of “one” that an ion collision will occur within a single rotation of the ion under the influence of E×B. The length of the chamber is chosen to insure heavy ions can make their way to the wall before transiting the device.