The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2004
Filed:
Apr. 26, 2002
Akira Matsumoto, Machida, JP;
Kazuki Hayashi, Saitama, JP;
Kurita Water Industries, Ltd., Tokyo, JP;
Abstract
An apparatus and a process for recovering an abrasive from a waste fluid of a chemical mechanical polishing (CMP) process. The apparatus comprises a pre-filter into which a waste fluid of a CMP process is introduced, a membrane separation apparatus into which filtered waste fluid obtained from the pre-filter is introduced, a washing unit wherein a concentrated slurry obtained from the membrane separation apparatus is washed with water and a post-filter wherein the concentrated slurry obtained from the washing unit is filtered. Particles of the abrasive are thereby efficiently recovered from a waste fluid discharged from a CMP process in semiconductor manufacturing factories and are reused.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile