The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2004
Filed:
Sep. 05, 2000
Takayasu Komatsu, Tokyo-to, JP;
Hiromitsu Ochiai, Tokyo-to, JP;
Akira Makita, Tokyo-to, JP;
Hirofumi Hideshima, Tokyo-to, JP;
Takuya Ogio, Tokyo-to, JP;
Toshimu Watanabe, Tokyo-to, JP;
Dai Nippon Printing Co., Ltd., Tokyo-to, JP;
Abstract
A shadow mask is formed from a plate member comprising an outer frame portion, a body portion of a shadow mask having an outer peripheral line formed through an etching process and a plurality of connection portions through which the body portion of the shadow mask is supported by the outer frame portion. The shadow mask is formed from the plate member by removing the outer frame portion from the body portion of the shadow mask. In this process, a break portion is formed to the shadow mask by removing the outer frame portion so as to be recessed inward from the outer peripheral line of the shadow mask.