The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2004

Filed:

Jan. 14, 2000
Applicant:
Inventors:

Sharon S. Liu, Cupertino, CA (US);

Jan Luehe, San Francisco, CA (US);

Assignee:

Sun Microsystems, Inc., Palo Alto, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 1/24 ;
U.S. Cl.
CPC ...
G06F 1/24 ;
Abstract

A mechanism for merging multiple source policies to derive a resultant policy is disclosed. The source policies, which may represent sets of laws/regulations, and which may comprise zero or more entries with each entry comprising an identifier and a set of one or more limitations, are merged by first selecting a current entry in a first source policy. Then a determination is made as to whether there is an entry in a second source policy which corresponds to the current entry. If so, then the limitations in the current entry are processed with the limitations in the corresponding entry to derive a set of resultant limitations. The limitations are processed such that the resultant limitations comprise the most restrictive limitations of the current entry and the corresponding entry. By doing so, it is ensured that the resultant limitations comply with both the first and the second source policies. Once the resultant limitations are derived, a new entry is created in the resultant policy which comprises the resultant limitations. The resultant policy is thus populated.


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