The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2004

Filed:

Oct. 24, 2001
Applicant:
Inventors:

Yingjian Chen, Fremont, CA (US);

Xizeng Shi, Fremont, CA (US);

Hugh Craig Hiner, Fremont, CA (US);

Zi-Wen Dong, Union City, CA (US);

Francis Liu, Fremont, CA (US);

Matthew R. Gibbons, Livermore, CA (US);

Joyce Anne Thompson, Menlo Park, CA (US);

William D. Jensen, Fremont, CA (US);

Chester Xiaowen Chien, San Jose, CA (US);

Yugang Wang, Milpitas, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/39 ; G11B 5/31 ;
U.S. Cl.
CPC ...
G11B 5/39 ; G11B 5/31 ;
Abstract

An inductive transducer having first and second magnetic pedestals disposed between first and second magnetic pole layers and adjacent to a media-facing surface, the pedestals separated by a submicron, nonmagnetic gap. The first pedestal extends less than the second pedestal from the media-facing surface, defining a short throat height. The second pedestal extends further to provide sufficient area for stitching to the second pole layer. The stitching and the thickness provided by the pedestals allow plural coil layers to be disposed between the pole layers, and the second pedestal, as well as other features, can be defined by high-resolution photolithography. The two coil layers have lower resistance, lower inductance and allow the pole layers to be shorter, improving performance. All or part of either or both of the pedestals may be formed of high magnetic saturation material, further enhancing performance.


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