The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2004

Filed:

Aug. 08, 2002
Applicant:
Inventors:

Pochi Albert Yeh, Thousand Oaks, CA (US);

Scott Patrick Campbell, Thousand Oaks, CA (US);

Assignee:

Accumux Technologies, Inc., Camarillo, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/03 ; G02B 2/700 ;
U.S. Cl.
CPC ...
G02F 1/03 ; G02B 2/700 ;
Abstract

Fine-tuning of the optical path length in etalon cavities is achieved by slight variations of the cavity's index of refraction. Such index of refraction variations are accomplished by varying the relative gas mixture in gas-gap etalons or UV-exposing doped glass layer(s) in solid etalons or gas-gap+glass etalons.


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