The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2004
Filed:
Jul. 31, 2002
InPhase Technologies, Inc., Longmont, CO (US);
Abstract
A method and system of recording successive holograms in a recording medium including a reflective substrate layer, a polarization shifting layer, and a photorecording medium layer is presented. A reference beam and an object beam are propagated at a first direction to a first area of the photorecording medium layer, where the reference beam and object beam have a same first polarization and interfere to produce a first interference grating. The reference beam and object beam are reflected with the reflective substrate layer to be incident the photorecording medium at a second direction, where the reference beam polarization and object beam polarization are altered with the polarization shifting layer to have a same second polarization. The reflected reference beam and object beam interfere to produce second interference grating, with the first polarization and second polarization being different.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile