The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2004
Filed:
May. 13, 2002
Harry Dietrich, Kirchardt, DE;
Volker Dudek, Korntal-Muenchingen, DE;
Andreas Schueppen, Lauffen, DE;
ATMEL Germany GmbH, Heilbronn, DE;
Abstract
A manufactured multi-layered silicon wafer with a buried insulating layer and buried areas with different parameters is formed by bonding together a first wafer and a second wafer. Before the bonding, areas with modified layer parameters, which will be buried by bonding with the second wafer, are created on the surface of the first wafer, which also has an insulating intermediate layer. A further insulating layer is then applied, and the surface of the first wafer is bonded to the surface of the second wafer. The substrate layer and the insulating intermediate layer of the first wafer are subsequently removed. This eliminates the conventional thinning of the second wafer. In addition, areas with vertical gradients can be created in the layer parameters without processing the second wafer.