The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2004
Filed:
Jul. 24, 2001
Shih-Chou Chen, Hsinchu, TW;
Chung-Kuang Hsieh, Feng-Yuan, TW;
Chih-Han Fang, Hsinchu Hsien, TW;
Yuh-Sheng Lin, Hsinchu, TW;
Litek Opto-Electronics Co., Ltd., Hsinchu Hsien, TW;
Abstract
A production method of a light guide and a stamper, combining anisotropic etching and isotropic etching. First a plurality of microstructures is formed on a back surface and a front surface of the substrate. By electroforming, rear and front stampers are made from the back and front surfaces of the substrate. Light guides are produced using the rear and front stampers. Anisotropic etching is performed on the front surface of the substrate, forming V-shaped, U-shaped or pyramid like microstructures. Isotropic etching is performed on the back surface of the substrate, forming quadratic, bowl like, oval or semicircular microstructures. If a transparent substrate is used, then after finishing the etching of microstructures, a light source, a reflector, a diffusion sheet and a prism sheet are added, simulating a back light module for performing a test of luminosity, uniformity of light intensity and light emission angle, so that optical properties are known before proceeding with inverse-forming of the stampers.