The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2004
Filed:
Oct. 05, 2001
Applicant:
Inventor:
Bradley O Stimson, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/434 ; H05H 1/24 ; H01L 2/1302 ; H01L 2/100 ;
U.S. Cl.
CPC ...
C23C 1/434 ; H05H 1/24 ; H01L 2/1302 ; H01L 2/100 ;
Abstract
In a plasma deposition system for depositing a film of sputtered target material on a substrate, the output of an RF generator coupled to a coil for generating a plasma can be varied during the deposition process so that heating and sputtering of the RF coil can be more uniform by “time-averaging” RF voltage distributions along the RF coil.
Stimson, Bradley. (2004). Use of variable rf generator to control coil voltage distribution (U.S. Patent No. 6719883). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6719883
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile