The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2004
Filed:
May. 02, 2001
Applicant:
Inventors:
Masashi Ueda, Fuchu, JP;
Tomoko Takagi, Tama, JP;
Assignee:
Ishikawajima-Harima Heavy Industries Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/00 ; C23C 1/600 ; H01J 2/100 ;
U.S. Cl.
CPC ...
H05H 1/00 ; C23C 1/600 ; H01J 2/100 ;
Abstract
A plasma processing apparatus is of an internal electrode type, and an inductive coupling type electrode arranged facing a substrate has a shape formed by bending back a conductor at its central portion. A high frequency power is supplied to an end of the electrode so that a standing wave of half wavelength are produced at straight portions formed by bending back the electrode to make an antinode there and thus a plasma discharge is generated around the electrode. The controlled standing waves with its antinodes positively generated at the straight portions of the electrode are effectively used.